GC Pattern Resin LS monomer 105 ml
Monomer liquid for GC Pattern Resin LS, a low-shrinkage, residue-free pattern resin.
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GC Pattern Resin LS monomer 105 ml
Monomer liquid for GC Pattern Resin LS, a low-shrinkage, residue-free pattern resin.
Description
Monomer component for GC Pattern Resin LS with controlled flow and rapid setting.
Product facts
- Volume: 105 ml
- System: GC Pattern Resin LS
- For brush and direct techniques
Benefits
Minimal polymerisation shrinkage, high strength and clean burnout support accurate copings, attachments, bars and implant patterns.
Processing
Mix only the system polymer and monomer. Build in small increments and follow GC instructions for direct or indirect techniques.